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Carbon Sputtering Target

Carbon Sputtering Target

Carbon Sputtering Target

Carbon sputtering target is a functional target material made of high-purity carbon materials such as graphite, diamond films, etc. It is the core component of the sputtering coating process in physical vapor deposition technology, which hasย excellent conductivity, stability and controllable sputtering efficiency. It can form uniform carbon films on the surfaces of substrates such as chips, optical components, and coated cutting tools. And it is widely applicable to the precise coating requirements in the fields of electronics, optics, and mechanics.

Advantages of Carbon Sputtering Target

Itsย common shapes include circular, rectangular or custom-shaped irregular structuresย and its advantages are particularly prominent in the coating process.

Excellent chemical stability

It isย less likely to react with other elements under high vacuum and high-energy particle bombardment conditions. Thus ensuring the purity of the coating composition.

 

Highly controllable sputtering rate

The thickness of the carbon film can be precisely controlled by adjusting process parameters to meet theย different thickness requirements.

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Wide adaptability

You can combine it with various substrates such as silicon and metals to form carbon films. The carbon films have characteristics such as high hardness, low friction coefficient or excellent conductivity.

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Wide range of purity control capabilities

You can prepare target materials ranging from high purity (above 99.99%) to doped types according to your needs, and flexibly adjust the performance of the carbon film.

 

Stable service life

Under standard usage conditions, the target material loss is uniform, which ensuresย the consistency of batch coating production.

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Uses of Carbon Sputtering Target

Electronic semiconductor field

Chip interconnect layer coating

You can useย carbon films formed by high-purity carbon sputtering targets as diffusion barriers or conductive layers. Using itย for the metal interconnect layers in chipsย canย enhance the conductivity and stability of the chips.

 

Sensor electrode preparation

You can use it on the surfaces of gas sensors and biosensors to form highly sensitive electrodes, ensuring the detection accuracy of the sensors.

 

Optical field

Optical lens anti-reflection/anti-refractive coatings

Using carbon films formed by carbon sputtering targets canย adjust the optical reflectivity and transmittance of lenses. It is suitable for optical components such as camera lenses and laser lenses.

 

Infrared window coating

You can use itย on the surface of the windows of infrared detection equipment. It canย enhance the wear resistance and infrared transmission performance of the windows.

 

Mechanical manufacturing field

Precision tool coating

You can useย DLC films formed by sputtering with diamond-like carbon targets to cover the surfaces of hard alloy tools. It can significantly improveย the hardness and wear resistance of the tools, and extend their service life.

 

Mold surface strengthening

You can deposit coatings on the surfaces of stamping molds and injection molds to reduceย wear. It reducesย the friction coefficient between the molds and the workย pieces, and improvesย the production efficiency of the molds.

 

New energy field

Fuel cell bipolar plate coating

Using itย on the surfaces of metal bipolar plates canย enhance the corrosion resistance and conductivity of the bipolar plates. Thus improving the power generation efficiency and lifespan of the fuel cells.

 

Lithium battery electrode modification

You can also use itย on the surfaces of positive or negative electrode materials of lithium batteries.ย It improvesย the electronic conductivity of the electrodes, enhancing the charging and discharging efficiency and cycle life of the batteries.

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