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Carbon Sputtering Target

Carbon Sputtering Target

Carbon Sputtering Target

Carbon sputtering target is a functional target material made of high-purity carbon materials such as graphite, diamond films, etc. It is the core component of the sputtering coating process in physical vapor deposition technology, which has excellent conductivity, stability and controllable sputtering efficiency. It can form uniform carbon films on the surfaces of substrates such as chips, optical components, and coated cutting tools. And it is widely applicable to the precise coating requirements in the fields of electronics, optics, and mechanics.

Advantages of Carbon Sputtering Target

Its common shapes include circular, rectangular or custom-shaped irregular structures and its advantages are particularly prominent in the coating process.

Excelente estabilidad química

It is less likely to react with other elements under high vacuum and high-energy particle bombardment conditions. Thus ensuring the purity of the coating composition.

 

Highly controllable sputtering rate

The thickness of the carbon film can be precisely controlled by adjusting process parameters to meet the different thickness requirements.

 

Wide adaptability

You can combine it with various substrates such as silicio and metals to form carbon films. The carbon films have characteristics such as high hardness, low friction coefficient or excellent conductivity.

 

Wide range of purity control capabilities

You can prepare target materials ranging from high purity (above 99.99%) to doped types according to your needs, and flexibly adjust the performance of the carbon film.

 

Stable service life

Under standard usage conditions, the target material loss is uniform, which ensures the consistency of batch coating production.

 

Uses of Carbon Sputtering Target

Electronic semiconductor field

Chip interconnect layer coating

You can use carbon films formed by high-purity carbon sputtering targets as diffusion barriers or conductive layers. Using it for the metal interconnect layers in chips can enhance the conductivity and stability of the chips.

 

Sensor electrode preparation

You can use it on the surfaces of gas sensors and biosensors to form highly sensitive electrodos, ensuring the detection accuracy of the sensors.

 

Optical field

Optical lens anti-reflection/anti-refractive coatings

Using carbon films formed by carbon sputtering targets can adjust the optical reflectivity and transmittance of lenses. It is suitable for optical components such as camera lenses and laser lenses.

 

Infrared window coating

You can use it on the surface of the windows of infrared detection equipment. It can enhance the wear resistance and infrared transmission performance of the windows.

 

Mechanical manufacturing field

Precision tool coating

You can use DLC films formed by sputtering with diamond-like carbon targets to cover the surfaces of hard alloy tools. It can significantly improve the hardness and wear resistance of the tools, and extend their service life.

 

Mold surface strengthening

You can deposit coatings on the surfaces of stamping molds and injection molds to reduce wear. It reduces the friction coefficient between the molds and the work pieces, and improves the production efficiency of the molds.

 

Nuevo campo de energía

Fuel cell bipolar plate coating

Using it on the surfaces of metal bipolar plates can enhance the corrosion resistance and conductivity of the bipolar plates. Thus improving the power generation efficiency and lifespan of the fuel cells.

 

Lithium battery electrode modification

You can also use it on the surfaces of positive or negative electrode materials of lithium batteries. It improves the electronic conductivity of the electrodes, enhancing the charging and discharging efficiency and cycle life of the batteries.

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