{"id":8065,"date":"2025-09-23T00:07:38","date_gmt":"2025-09-23T00:07:38","guid":{"rendered":"https:\/\/jinsuncarbon.com\/?post_type=product&p=8065"},"modified":"2025-09-23T00:07:39","modified_gmt":"2025-09-23T00:07:39","slug":"carbon-sputtering-target","status":"publish","type":"product","link":"https:\/\/jinsuncarbon.com\/ru\/%d0%bf%d1%80%d0%be%d0%b4%d1%83%d0%ba%d1%82\/carbon-sputtering-target\/","title":{"rendered":"\u041c\u0438\u0448\u0435\u043d\u044c \u0434\u043b\u044f \u043d\u0430\u043f\u044b\u043b\u0435\u043d\u0438\u044f \u0443\u0433\u043b\u0435\u0440\u043e\u0434\u0430"},"content":{"rendered":"
Its\u00a0common shapes include circular, rectangular or custom-shaped irregular structures\u00a0and its advantages are particularly prominent in the coating process.<\/p>\n
E<\/b><\/strong>\u041e\u0442\u043b\u0438\u0447\u043d\u0430\u044f \u0445\u0438\u043c\u0438\u0447\u0435\u0441\u043a\u0430\u044f \u0441\u0442\u0430\u0431\u0438\u043b\u044c\u043d\u043e\u0441\u0442\u044c<\/b><\/strong><\/p>\n It is\u00a0less likely to react with other elements under high vacuum and high-energy particle bombardment conditions. Thus ensuring the purity of the coating composition.<\/p>\n <\/p>\n H<\/b><\/strong>ighly controllable sputtering rate<\/b><\/strong><\/p>\n The thickness of the carbon film can be precisely controlled by adjusting process parameters to meet the\u00a0different thickness requirements.<\/p>\n \u00a0<\/b><\/strong><\/p>\n