Graphite Tray

Advantages of graphite tray

High-temperature resistant

It can withstand temperatures above 2800℃ in an inert environment, which can adapt to extremely high-temperature processing environments.

Resistant to thermal shock

It has an extremely low thermal expansion coefficient, unlikely to crack or deform in sudden cooling and heating environments.

Хорошо химическая стабильность

Resistant to acids, alkalis and corrosive gases, does not react with the load, and has no impurity pollution.

Равномерная теплопроводность

Because of the high heat conductivity and uniform conduction, it can ensure consistent heating of the workpiece.

Light and sturdy

Its density is only 2.2g/cm³, and its anti-pressure strength is over 80MPa, so it has strong load-bearing capacity.

In addition, based on your specific requirements, it can be processed into the size and shape you need. Usually, graphite tray has a variety of shapes such as flat, grooved or perforated.

Uses of graphite tray

Производство полупроводников

You can use it to support substrates in metal organic chemical vapor deposition (MOCVD) equipment. It can perform epitaxial deposition under high temperature and high vacuum conditions and prevent impurity contamination, ensuring the quality of the epitaxial layer. And it can operate stably at high temperatures (usually above 1000℃) without deformation or damage.

Single crystal growth

In the single crystal furnace, you can place it beneath the графитовый тигель to ensure that the crucible remains stable. With the excellent corrosion resistance to molten metals and chemical gases, it can be used for a long time. It conducts heat evenly, ensuring a uniform temperature distribution within the crucible and facilitating the growth of high-quality single crystals.

Химическая промышленность

You can also use it in high-temperature reactors to support and protect the reactants, improving the reaction efficiency. It can prevent the reactants from coming into direct contact with the reactor and causing adverse reactions. And because of the excellent corrosion resistance to a variety of chemical substances, it is suitable for various chemical reactions.

LED Manufacturing

In the LED epitaxial wafer manufacturing process, you can use graphite tray to support the wafer substrates. During the high-temperature epitaxial deposition process, it is employed to bear the wafer substrates, ensuring uniform temperature on the substrate surface. And it can also withstand the weight of the wafer substrates and the mechanical stress during the process. Meanwhile, with the smooth and chemically stable surface of graphite, it does not react with the components. Thus effectively protecting the precise structure and surface quality of the components.