{"id":8065,"date":"2025-09-23T00:07:38","date_gmt":"2025-09-23T00:07:38","guid":{"rendered":"https:\/\/jinsuncarbon.com\/?post_type=product&p=8065"},"modified":"2025-09-23T00:07:39","modified_gmt":"2025-09-23T00:07:39","slug":"carbon-sputtering-target","status":"publish","type":"product","link":"https:\/\/jinsuncarbon.com\/id\/produk\/carbon-sputtering-target\/","title":{"rendered":"Target Sputtering Karbon"},"content":{"rendered":"

Advantages of Carbon Sputtering Target<\/h2>\n

Its\u00a0common shapes include circular, rectangular or custom-shaped irregular structures\u00a0and its advantages are particularly prominent in the coating process.<\/p>\n

E<\/b><\/strong>xstabilitas kimia yang sangat baik<\/b><\/strong><\/p>\n

It is\u00a0less likely to react with other elements under high vacuum and high-energy particle bombardment conditions. Thus ensuring the purity of the coating composition.<\/p>\n

 <\/p>\n

H<\/b><\/strong>ighly controllable sputtering rate<\/b><\/strong><\/p>\n

The thickness of the carbon film can be precisely controlled by adjusting process parameters to meet the\u00a0different thickness requirements.<\/p>\n

\u00a0<\/b><\/strong><\/p>\n

W<\/b><\/strong>ide adaptability<\/b><\/strong><\/p>\n

You can combine it with various substrates such as silikon<\/a> and metals to form carbon films. The carbon films have characteristics such as high hardness, low friction coefficient or excellent conductivity.<\/p>\n

\u00a0<\/b><\/strong><\/p>\n

Wide range of purity control capabilities<\/b><\/strong><\/p>\n

You can prepare target materials ranging from high purity (above 99.99%) to doped types according to your needs, and flexibly adjust the performance of the carbon film.<\/p>\n

 <\/p>\n

Stable service life<\/b><\/strong><\/p>\n

Under standard usage conditions, the target material loss is uniform, which ensures\u00a0the consistency of batch coating production.<\/p>\n

\u00a0<\/b><\/strong><\/p>\n

Uses of Carbon Sputtering Target<\/h2>\n

Electronic semiconductor field<\/h3>\n

Chip interconnect layer coating<\/b><\/strong><\/p>\n

You can use\u00a0carbon films formed by high-purity carbon sputtering targets as diffusion barriers or conductive layers. Using it\u00a0for the metal interconnect layers in chips\u00a0can\u00a0enhance the conductivity and stability of the chips.<\/p>\n

 <\/p>\n

Sensor electrode preparation<\/b><\/strong><\/p>\n

You can use it on the surfaces of gas sensors and biosensors to form highly sensitive elektroda<\/a>, ensuring the detection accuracy of the sensors.<\/p>\n

 <\/p>\n

Optical field<\/h3>\n

Optical lens anti-reflection\/anti-refractive coatings<\/b><\/strong><\/p>\n

Using carbon films formed by carbon sputtering targets can\u00a0adjust the optical reflectivity and transmittance of lenses. It is suitable for optical components such as camera lenses and laser lenses.<\/p>\n

 <\/p>\n

Infrared window coating<\/b><\/strong><\/p>\n

You can use it\u00a0on the surface of the windows of infrared detection equipment. It can\u00a0enhance the wear resistance and infrared transmission performance of the windows.<\/p>\n

 <\/p>\n

Mechanical manufacturing field<\/h3>\n

Precision tool coating<\/b><\/strong><\/p>\n

You can use\u00a0DLC films formed by sputtering with diamond-like carbon targets to cover the surfaces of hard alloy tools. It can significantly improve\u00a0the hardness and wear resistance of the tools, and extend their service life.<\/p>\n

 <\/p>\n

Mold surface strengthening<\/b><\/strong><\/p>\n

You can deposit coatings on the surfaces of stamping molds and injection molds to reduce\u00a0wear. It reduces\u00a0the friction coefficient between the molds and the work\u00a0pieces, and improves\u00a0the production efficiency of the molds.<\/p>\n

 <\/p>\n

Bidang energi baru<\/h3>\n

Fuel cell bipolar plate coating<\/b><\/strong><\/p>\n

Using it\u00a0on the surfaces of metal bipolar plates can\u00a0enhance the corrosion resistance and conductivity of the bipolar plates. Thus improving the power generation efficiency and lifespan of the fuel cells.<\/p>\n

 <\/p>\n

Lithium battery electrode modification<\/b><\/strong><\/p>\n

You can also use it\u00a0on the surfaces of positive or negative electrode materials of lithium batteries.\u00a0It improves\u00a0the electronic conductivity of the electrodes, enhancing the charging and discharging efficiency and cycle life of the batteries.<\/p>","protected":false},"excerpt":{"rendered":"

Carbon sputtering target is a functional target material made of high-purity carbon materials such as graphite, diamond films, etc. It is the core component of the sputtering coating process in physical vapor deposition technology, which has\u00a0excellent conductivity, stability and controllable sputtering efficiency. It can form uniform carbon films on the surfaces of substrates such as chips, optical components, and coated cutting tools. And it is widely applicable to the precise coating requirements in the fields of electronics, optics, and mechanics.<\/p>","protected":false},"featured_media":8073,"template":"","meta":[],"product_brand":[],"product_cat":[39],"product_tag":[],"class_list":{"0":"post-8065","1":"product","2":"type-product","3":"status-publish","4":"has-post-thumbnail","6":"product_cat-carbon-products","8":"first","9":"instock","10":"shipping-taxable","11":"product-type-simple"},"yoast_head":"\nCarbon Sputtering Target | Jinsun Carbon<\/title>\n<meta name=\"robots\" content=\"index, follow, max-snippet:-1, max-image-preview:large, max-video-preview:-1\" \/>\n<link rel=\"canonical\" href=\"https:\/\/jinsuncarbon.com\/id\/produk\/carbon-sputtering-target\/\" \/>\n<meta property=\"og:locale\" content=\"id_ID\" \/>\n<meta property=\"og:type\" content=\"article\" \/>\n<meta property=\"og:title\" content=\"Carbon Sputtering Target\" \/>\n<meta property=\"og:description\" content=\"Carbon sputtering target is a functional target material made of high-purity carbon materials such as graphite, diamond films, etc. It is the core component of the sputtering coating process in physical vapor deposition technology, which has\u00a0excellent conductivity, stability and controllable sputtering efficiency. 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